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APA Citation
Scopece, D., Döbeli, M., Passerone, D., Maeder, X., Neels, A., Widrig, B., Dommann, A., Müller, U., & Ramm, J. (2016). silicon etch with chromium ions generated by a filtered or non-filtered cathodic arc discharge. Science and technology of advanced materials, 17(1), 20–28. http://access.bl.uk/ark:/81055/vdc_100085019529.0x000033