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APA Citation
Ishii, Y., Scott-McCabe, R., Yu, A., Okuma, K., Maeda, K., Sebastian, J., & Manos, J. (n.d.). anisotropic selective etching between SiGe and Si. Japanese journal of applied physics, 57, . http://access.bl.uk/ark:/81055/vdc_100087621397.0x000061