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APA Citation
Matsuoka, H., Kanahashi, K., Tanaka, N., Shoji, Y., Li, L., Pu, J., Ito, H., Ohta, H., Fukushima, T., & Takenobu, T. (n.d.). chemical hole doping into large-area transition metal dichalcogenide monolayers using boron-based oxidant. Japanese journal of applied physics, 57, . http://access.bl.uk/ark:/81055/vdc_100087643013.0x000061