Cite
MLA Citation
Fen Lin et al.. “Impacts of light illumination on monocrystalline silicon surfaces passivated by atomic layer deposited Al2O3 capped with plasma-enhanced chemical vapor deposited SiNx.” Japanese journal of applied physics, vol. 56, n.d., p. . http://access.bl.uk/ark:/81055/vdc_100087552002.0x00005d