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MLA Citation
Tomihito Ohba et al.. “Atomic layer etching of GaN and AlGaN using directional plasma-enhanced approach.” Japanese journal of applied physics, vol. 56, n.d., p. . http://access.bl.uk/ark:/81055/vdc_100087650186.0x000060
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Tomihito Ohba et al.. “Atomic layer etching of GaN and AlGaN using directional plasma-enhanced approach.” Japanese journal of applied physics, vol. 56, n.d., p. . http://access.bl.uk/ark:/81055/vdc_100087650186.0x000060