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APA Citation
Itoh, S., Takahashi, K., Fukuzawa, K., & Zhang, H. (n.d.). measurement of viscoelasticity of UV photoresist used for nanoimprint lithography under confinement in nanometer-sized gaps. Japanese journal of applied physics, 56, . http://access.bl.uk/ark:/81055/vdc_100087643140.0x000063