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HARVARD Citation
Itoh, S. et al. (n.d.). Measurement of viscoelasticity of UV photoresist used for nanoimprint lithography under confinement in nanometer-sized gaps. Japanese journal of applied physics. p. . [Online].
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Itoh, S. et al. (n.d.). Measurement of viscoelasticity of UV photoresist used for nanoimprint lithography under confinement in nanometer-sized gaps. Japanese journal of applied physics. p. . [Online].