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APA Citation
Takeuchi, K., Ezoe, Y., Ishikawa, K., Nakamura, K., Numazawa, M., Terada, M., Fujitani, M., Ishi, D., Noda, Y., Ohashi, T., Morishita, K., Nakajima, K., & Mitsuda, K. (n.d.). x-ray evaluation of high-verticality sidewalls fabricated by deep reactive ion etching. Japanese journal of applied physics, 56, . http://access.bl.uk/ark:/81055/vdc_100087647661.0x000064