Effect of trapped charge in AlGaN/GaN and AlGaN/InGaN/GaN heterostructure by temperature dependent threshold voltage analysis. (January 2018)
- Record Type:
- Journal Article
- Title:
- Effect of trapped charge in AlGaN/GaN and AlGaN/InGaN/GaN heterostructure by temperature dependent threshold voltage analysis. (January 2018)
- Main Title:
- Effect of trapped charge in AlGaN/GaN and AlGaN/InGaN/GaN heterostructure by temperature dependent threshold voltage analysis
- Authors:
- Chakraborty, Apurba
Ghosh, Saptarsi
Mukhopadhyay, Partha
Das, Subhashis
Bag, Ankush
Biswas, Dhrubes - Abstract:
- Abstract: The effect of trap energy states in AlGaN/InGaN/GaN heterostructure is investigated by temperature dependent threshold voltage measurement from 298 K to 373 K. It is found that the threshold voltage of AlGaN/InGaN/GaN structure decreases from - 6.52 V to - 6.90 V with temperature increase from 298 K to 348 K. But for the temperature higher than 348 K, the threshold voltage starts to increase and reaches to - 6.75 V at 373 K. However, the threshold voltage for AlGaN/GaN structure decreases consistently from −5.32 V to −6.4 V for entire range of temperature. The decrease of threshold voltage is attributed to the surface donor trap charges for both the heterostructures. Furthermore, the acceptor trap charges might have contributed for temperature above 348 K, and hence the increase of threshold voltage is observed in AlGaN/InGaN/GaN heterostructure. Higher crystal defects, resulted from lower growth temperature, might be responsible for the formation of these acceptor trap levels in InGaN layer. Highlights: Temperature dependent capacitance measurement is carried out in AlGaN/GaN and AlGaN/InGaN/GaN heterostructures. From capacitance-voltage measurement, it is found that the threshold voltage (VTH ) of AlGaN/InGaN/GaN decreases from - 6.52 to - 6.90 V up to temperature 348 K, and after that the same stars increasing and reaches to −6.75 V. However, the VTH of AlGaN/GaN decreases from - 5.32 V to - 6.4 V consistently for same increase of temperature. The decrease ofAbstract: The effect of trap energy states in AlGaN/InGaN/GaN heterostructure is investigated by temperature dependent threshold voltage measurement from 298 K to 373 K. It is found that the threshold voltage of AlGaN/InGaN/GaN structure decreases from - 6.52 V to - 6.90 V with temperature increase from 298 K to 348 K. But for the temperature higher than 348 K, the threshold voltage starts to increase and reaches to - 6.75 V at 373 K. However, the threshold voltage for AlGaN/GaN structure decreases consistently from −5.32 V to −6.4 V for entire range of temperature. The decrease of threshold voltage is attributed to the surface donor trap charges for both the heterostructures. Furthermore, the acceptor trap charges might have contributed for temperature above 348 K, and hence the increase of threshold voltage is observed in AlGaN/InGaN/GaN heterostructure. Higher crystal defects, resulted from lower growth temperature, might be responsible for the formation of these acceptor trap levels in InGaN layer. Highlights: Temperature dependent capacitance measurement is carried out in AlGaN/GaN and AlGaN/InGaN/GaN heterostructures. From capacitance-voltage measurement, it is found that the threshold voltage (VTH ) of AlGaN/InGaN/GaN decreases from - 6.52 to - 6.90 V up to temperature 348 K, and after that the same stars increasing and reaches to −6.75 V. However, the VTH of AlGaN/GaN decreases from - 5.32 V to - 6.4 V consistently for same increase of temperature. The decrease of threshold voltage is attributed to surface donor trapped charge in both the heterostructures. The increase of VTH in AlGaN/InGaN/GaN heterostructure above 348 K is correlated to the formation of acceptor trapped charges. … (more)
- Is Part Of:
- Superlattices and microstructures. Volume 113(2018)
- Journal:
- Superlattices and microstructures
- Issue:
- Volume 113(2018)
- Issue Display:
- Volume 113, Issue 2018 (2018)
- Year:
- 2018
- Volume:
- 113
- Issue:
- 2018
- Issue Sort Value:
- 2018-0113-2018-0000
- Page Start:
- 147
- Page End:
- 152
- Publication Date:
- 2018-01
- Subjects:
- Superlattices as materials -- Periodicals
Microstructure -- Periodicals
Semiconductors -- Periodicals
Superréseaux -- Périodiques
Microstructure (Physique) -- Périodiques
Semiconducteurs -- Périodiques
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/07496036 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.spmi.2017.10.033 ↗
- Languages:
- English
- ISSNs:
- 0749-6036
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8547.076700
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 11483.xml