Cite
MLA Citation
Nithi Atthi et al.. “Si Surface Orientation Dependence on the Electrical Characteristics of HfN Gate Insulator with sub-0.5 nm EOT Formed by ECR Plasma Sputtering.” MRS proceedings, no. 1588, 2014, p. . http://access.bl.uk/ark:/81055/vdc_100050732832.0x000006