Cite
HARVARD Citation
Wells, G. et al. (2019). High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layers Using Deep X-ray Lithography at SyLMAND. Synchrotron radiation news. 32 (4), pp. 44-47. [Online].
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Wells, G. et al. (2019). High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layers Using Deep X-ray Lithography at SyLMAND. Synchrotron radiation news. 32 (4), pp. 44-47. [Online].