High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layers Using Deep X-ray Lithography at SyLMAND. Issue 4 (4th July 2019)

Record Type:: Journal Article
Title:: High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layers Using Deep X-ray Lithography at SyLMAND. Issue 4 (4th July 2019)
Main Title:: High-Aspect-Ratio Micropatterning Capabilities into Thick Resist Layers Using Deep X-ray Lithography at SyLMAND
Authors:: Wells, Garth
Achenbach, Sven
Klymyshyn, David
Jacobs, Michael
Mazhar, Waqas
Abstract:
Is Part Of:: Synchrotron radiation news. Volume 32:Issue 4(2019)
Journal:: Synchrotron radiation news
Issue:: Volume 32:Issue 4(2019)
Issue Display:: Volume 32, Issue 4 (2019)
Year:: 2019
Volume:: 32
Issue:: 4
Issue Sort Value:: 2019-0032-0004-0000
Page Start:: 44
Page End:: 47
Publication Date:: 2019-07-04
Subjects:: Synchrotron radiation -- Periodicals
Synchrotron radiation sources -- Periodicals
539.735
Journal URLs:: http://www.tandfonline.com/toc/gsrn20/current ↗
http://www.tandfonline.com/ ↗
DOI:: 10.1080/08940886.2019.1634438 ↗
Languages:: English
ISSNs:: 0894-0886
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library DSC - 8585.886500
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store
Ingest File:: 11348.xml