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APA Citation
Lin, D., Pi, S., Yang, J., Tiwari, N., Ren, J., Zhang, Q., Liu, P., & Shieh, H. (n.d.). enhanced stability of thin film transistors with double-stacked amorphous IWO/IWO:N channel layer. Semiconductor science and technology, 33, . http://access.bl.uk/ark:/81055/vdc_100087649326.0x00004f