Molecular beam epitaxial growth of high quality Ga-catalyzed GaAs1–xSbx(x > 0.8) nanowires on Si (111) with photoluminescence emission reaching 1.7 μm. (25th October 2018)
- Record Type:
- Journal Article
- Title:
- Molecular beam epitaxial growth of high quality Ga-catalyzed GaAs1–xSbx(x > 0.8) nanowires on Si (111) with photoluminescence emission reaching 1.7 μm. (25th October 2018)
- Main Title:
- Molecular beam epitaxial growth of high quality Ga-catalyzed GaAs1–xSbx(x > 0.8) nanowires on Si (111) with photoluminescence emission reaching 1.7 μm
- Authors:
- Deshmukh, Prithviraj
Sharma, Manish
Nalamati, Surya
Reynolds, C Lewis
Liu, Yang
Iyer, Shanthi - Abstract:
- Abstract: The advancement of ternary GaAsSb mismatched alloy system toward the Sb-rich corner of the phase diagram in the nanowire (NW) configuration on silicon remains a challenge. A large lattice mismatch between the silicon substrate and GaAsSb with an Sb-rich composition, along with the low supersaturation and low solubility of Sb in the Ga droplet in the vapor–liquid–solid growth mechanism, causes significant issues during Ga-assisted molecular beam epitaxial growth of these NWs. In this work, we have carried out a systematic study of Sb-rich GaAs1– x Sb x NWs grown on Si (111) using variations of the Ga, As, and Sb beam equivalent pressures (BEP) to minimize undesirable parasitic growth and achieve photoemission up to 1.7 μ m. Ga-assisted molecular beam epitaxy is the enabling growth technology for the growth of these self-catalyzed GaAs1– x Sb x ( x > 0.8) NWs. The use of a dual substrate temperature approach along with low As background pressure and a low Ga BEP were found to be the key growth components in achieving a well-faceted NW morphology with a low parasitic layer on the substrate. Energy-dispersive x-ray spectroscopy analysis confirms uniform compositional homogeneity along the NWs, while selected-area electron diffraction patterns in the transmission electron microscope revealed a zinc-blende crystal structure. A peak μ -photoluminescence emission of 1680 nm with a narrow FWHM was obtained at 4 K. Raman spectra at room temperature exhibit only GaSb relatedAbstract: The advancement of ternary GaAsSb mismatched alloy system toward the Sb-rich corner of the phase diagram in the nanowire (NW) configuration on silicon remains a challenge. A large lattice mismatch between the silicon substrate and GaAsSb with an Sb-rich composition, along with the low supersaturation and low solubility of Sb in the Ga droplet in the vapor–liquid–solid growth mechanism, causes significant issues during Ga-assisted molecular beam epitaxial growth of these NWs. In this work, we have carried out a systematic study of Sb-rich GaAs1– x Sb x NWs grown on Si (111) using variations of the Ga, As, and Sb beam equivalent pressures (BEP) to minimize undesirable parasitic growth and achieve photoemission up to 1.7 μ m. Ga-assisted molecular beam epitaxy is the enabling growth technology for the growth of these self-catalyzed GaAs1– x Sb x ( x > 0.8) NWs. The use of a dual substrate temperature approach along with low As background pressure and a low Ga BEP were found to be the key growth components in achieving a well-faceted NW morphology with a low parasitic layer on the substrate. Energy-dispersive x-ray spectroscopy analysis confirms uniform compositional homogeneity along the NWs, while selected-area electron diffraction patterns in the transmission electron microscope revealed a zinc-blende crystal structure. A peak μ -photoluminescence emission of 1680 nm with a narrow FWHM was obtained at 4 K. Raman spectra at room temperature exhibit only GaSb related LO and TO modes, which attest to the high quality of the NWs grown. This is a promising approach due to the broad scope of applicability to grow other mismatched alloy material systems in a NW configuration. … (more)
- Is Part Of:
- Semiconductor science and technology. Volume 33:Number 12(2018:Dec.)
- Journal:
- Semiconductor science and technology
- Issue:
- Volume 33:Number 12(2018:Dec.)
- Issue Display:
- Volume 33, Issue 12 (2018)
- Year:
- 2018
- Volume:
- 33
- Issue:
- 12
- Issue Sort Value:
- 2018-0033-0012-0000
- Page Start:
- Page End:
- Publication Date:
- 2018-10-25
- Subjects:
- molecular beam epitaxy -- transmission electron microscopy -- photoluminescence spectroscopy -- axial GaAsSb nanowires
Semiconductors -- Periodicals
621.38152 - Journal URLs:
- http://iopscience.iop.org/0268-1242/1 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1361-6641/aae7b8 ↗
- Languages:
- English
- ISSNs:
- 0268-1242
- Deposit Type:
- Legaldeposit
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- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
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