Cite
HARVARD Citation
Kim, E. et al. (n.d.). Physical stability against hydrogen plasma for ZnInSnO thin films deposited by combinatorial RF magnetron sputtering. Japanese journal of applied physics. p. . [Online].
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Kim, E. et al. (n.d.). Physical stability against hydrogen plasma for ZnInSnO thin films deposited by combinatorial RF magnetron sputtering. Japanese journal of applied physics. p. . [Online].