An oxygen vacancy mediated Ag reduction and nucleation mechanism in SiO2 RRAM devices. (July 2019)
- Record Type:
- Journal Article
- Title:
- An oxygen vacancy mediated Ag reduction and nucleation mechanism in SiO2 RRAM devices. (July 2019)
- Main Title:
- An oxygen vacancy mediated Ag reduction and nucleation mechanism in SiO2 RRAM devices
- Authors:
- Patel, K.
Cottom, J.
Bosman, M.
Kenyon, A.J.
Shluger, A.L. - Abstract:
- Abstract: Density Functional Theory (DFT) calculations were used to model the incorporation and diffusion of Ag in Ag/SiO2 /Me (Me = W or Pt) resistive random-access memory (RRAM) devices. We consider an O vacancy (VO ) mediated model of the initial stages of Ag clustering, where the VO is identified as the principle site for Ag + reduction. The Ag + interstitial is calculated to be energetically favoured inside a-SiO2 at the Fermi energies of Ag, W and Pt. The adiabatic diffusion barriers of Ag + are found to be lower than those for Ag 0 with a strong dependence on the local network structure, supporting Ag + being the mobile species during device operation. Ag + ions bind to VO forming the [Ag/VO ] + complex. The [Ag/VO ] + complex is then reduced by trapping an electron forming [Ag/VO ] 0 . By sampling every VO in a 216-atom cell of a-SiO2 we demonstrate that this mechanism can occur only at 33%, 33% and 11% of O vacancies at the Ag, W and Pt electrodes, respectively. This complex can subsequently act as a nucleation site for Ag clustering with the formation of [Ag2 /VO ] +, which is reduced by trapping an extra electron. Highlights: The diffusion barriers for Ag + are lower than Ag 0 for a given ring size in a-SiO2 . Ag + is lowest energy charge state at the Fermi energies of Ag, W and Pt. Ag + binds to O vacancies forming [Ag/VO ] + which trap an electron to form [Ag/VO ] 0 . Ag + binding to [Ag/VO ] 0 forming [Agi /VO ] complexes is thermodynamically favourable. 33%,Abstract: Density Functional Theory (DFT) calculations were used to model the incorporation and diffusion of Ag in Ag/SiO2 /Me (Me = W or Pt) resistive random-access memory (RRAM) devices. We consider an O vacancy (VO ) mediated model of the initial stages of Ag clustering, where the VO is identified as the principle site for Ag + reduction. The Ag + interstitial is calculated to be energetically favoured inside a-SiO2 at the Fermi energies of Ag, W and Pt. The adiabatic diffusion barriers of Ag + are found to be lower than those for Ag 0 with a strong dependence on the local network structure, supporting Ag + being the mobile species during device operation. Ag + ions bind to VO forming the [Ag/VO ] + complex. The [Ag/VO ] + complex is then reduced by trapping an electron forming [Ag/VO ] 0 . By sampling every VO in a 216-atom cell of a-SiO2 we demonstrate that this mechanism can occur only at 33%, 33% and 11% of O vacancies at the Ag, W and Pt electrodes, respectively. This complex can subsequently act as a nucleation site for Ag clustering with the formation of [Ag2 /VO ] +, which is reduced by trapping an extra electron. Highlights: The diffusion barriers for Ag + are lower than Ag 0 for a given ring size in a-SiO2 . Ag + is lowest energy charge state at the Fermi energies of Ag, W and Pt. Ag + binds to O vacancies forming [Ag/VO ] + which trap an electron to form [Ag/VO ] 0 . Ag + binding to [Ag/VO ] 0 forming [Agi /VO ] complexes is thermodynamically favourable. 33%, 33% and 11% of vacancies trap and reduce Ag + at the Ag, W and Pt electrodes. … (more)
- Is Part Of:
- Microelectronics and reliability. Volume 98(2019)
- Journal:
- Microelectronics and reliability
- Issue:
- Volume 98(2019)
- Issue Display:
- Volume 98, Issue 2019 (2019)
- Year:
- 2019
- Volume:
- 98
- Issue:
- 2019
- Issue Sort Value:
- 2019-0098-2019-0000
- Page Start:
- 144
- Page End:
- 152
- Publication Date:
- 2019-07
- Subjects:
- Electronic apparatus and appliances -- Reliability -- Periodicals
Miniature electronic equipment -- Periodicals
Appareils électroniques -- Fiabilité -- Périodiques
Équipement électronique miniaturisé -- Périodiques
Electronic apparatus and appliances -- Reliability
Miniature electronic equipment
Periodicals
621.3815 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00262714 ↗
http://www.elsevier.com/journals ↗
http://www.elsevier.com/homepage/elecserv.htt ↗ - DOI:
- 10.1016/j.microrel.2019.05.005 ↗
- Languages:
- English
- ISSNs:
- 0026-2714
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5758.979000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 10922.xml