Cite
APA Citation
Lee, H., Hung, C., Leng, C., Lian, N., Young, L., Yang, T., Chen, K., & Lu, C. (2008). etch Defect Characterization and Reduction in Hard-Mask-Based Al Interconnect Etching. International journal of plasma science and engineering, 2008, . http://access.bl.uk/ark:/81055/vdc_100082259641.0x000043