Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2. Issue 7 (July 2019)

• Record Type: Journal Article
• Authors: Hu, Zhangping; Xu, Yifei; Chen, Yuanyuan; Schützendübe, Peter; Wang, Jiangyong; Huang, Yuan; Liu, Yongchang; Wang, Zumin
• Is Part Of: Journal of materials science & technology. Volume 35:Issue 7(2019)
• Page Start: 1479
• Page End: 1484
• Publication Date: 2019-07
• Subjects: Thermal oxidation -- Zr-Al alloys -- Amorphous oxides -- Oxidation kinetics -- Interface thermodynamics; Metals -- Periodicals; Materials science -- Periodicals; Materials science; Metals; Periodicals; 620.1105
• DOI: 10.1016/j.jmst.2019.02.005
• Languages: English
• ISSNs: 1005-0302

Abstract

Abstract: The thermal oxidation of ZrAl2 in the temperature range of 550–750 °C in pure oxygen has been investigated by a combinational experimental approach using X-ray diffraction, scanning electron microscopy/energy dispersive spectrometer, Auger electron spectroscopy and cross-sectional transmission electron microscopy. The thermal oxidation leads to the growth of anomalously thick (up to 4.5 μm) amorphous (Zr0.33 Al0.67 )O1.66 surficial layers at temperatures as high as 750 °C. The oxidation kinetics obeys a parabolic law with an activation energy of 143 kJ/mol. The underlying mechanism for the formation of such micrometer-thick amorphous oxide surficial layers has been discussed on the basis of interface thermodynamics and the occurrence of high interface stability associated with a synchronous oxidation of Al and Zr elements.