Cite
HARVARD Citation
Garay, A. et al. (2015). Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma. Vacuum. pp. 19-24. [Online].
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Garay, A. et al. (2015). Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma. Vacuum. pp. 19-24. [Online].