Cite
HARVARD Citation
Park, H. et al. (2018). Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study. RSC advances. 8 (68), pp. 39039-39046. [Online].
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Park, H. et al. (2018). Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study. RSC advances. 8 (68), pp. 39039-39046. [Online].