AES and XPS depth‐profiling of annealed AlN/Ti‐Al/AlN films for high‐temperature applications in SAW metallization. (23rd March 2018)

Record Type:: Journal Article
Title:: AES and XPS depth‐profiling of annealed AlN/Ti‐Al/AlN films for high‐temperature applications in SAW metallization. (23rd March 2018)
Main Title:: AES and XPS depth‐profiling of annealed AlN/Ti‐Al/AlN films for high‐temperature applications in SAW metallization
Authors:: Oswald, S.
Lattner, E.
Seifert, M.
Menzel, S.
Abstract:
Is Part Of:: Surface and interface analysis. Volume 50:Number 11(2018)
Journal:: Surface and interface analysis
Issue:: Volume 50:Number 11(2018)
Issue Display:: Volume 50, Issue 11 (2018)
Year:: 2018
Volume:: 50
Issue:: 11
Issue Sort Value:: 2018-0050-0011-0000
Page Start:: 991
Page End:: 995
Publication Date:: 2018-03-23
Subjects:: Surfaces (Physics) -- Periodicals
Surface chemistry -- Periodicals
Thin films -- Periodicals
541.33
Journal URLs:: http://onlinelibrary.wiley.com/ ↗
DOI:: 10.1002/sia.6393 ↗
Languages:: English
ISSNs:: 0142-2421
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library DSC - 8547.742000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store
Ingest File:: 8376.xml