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APA Citation
Lim, N., Pak, Y., Kim, J. T., Hwang, Y., Lee, R., Kumaresan, Y., Myoung, N., Ko, H. C., & Jung, G. Y. (2015). a tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer. Nanoscale, 7(32), 13489–13494. http://access.bl.uk/ark:/81055/vdc_100070991014.0x000001