Cite
HARVARD Citation
Lim, N. et al. (2015). A tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer. Nanoscale. 7 (32), pp. 13489-13494. [Online].
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Lim, N. et al. (2015). A tunable sub-100 nm silicon nanopore array with an AAO membrane mask: reducing unwanted surface etching by introducing a PMMA interlayer. Nanoscale. 7 (32), pp. 13489-13494. [Online].