A novel vacuum epitaxial lift-off (VELO) process for separation of hard GaAs substrate/carrier systems for a more green semiconductor LED production. (15th November 2017)
- Record Type:
- Journal Article
- Title:
- A novel vacuum epitaxial lift-off (VELO) process for separation of hard GaAs substrate/carrier systems for a more green semiconductor LED production. (15th November 2017)
- Main Title:
- A novel vacuum epitaxial lift-off (VELO) process for separation of hard GaAs substrate/carrier systems for a more green semiconductor LED production
- Authors:
- Englhard, M.
Reuters, B.
Michaelis, F.B.
Behringer, M.
Sundgren, P.
Klemp, C.
Skibitzki, O.
Schroeder, T. - Abstract:
- Abstract: This study reports on a novel vacuum epitaxial lift-off (VELO) process to reuse the GaAs substrates in light-emitting diode (LED) production. The method is based on an epitaxial lift-off technique, whose application is however limited to flexible wafers, as gaseous reaction products (e.g. AsH 3 ) formed during the etching of AlAs with hydrofluoric acid are trapped within the wafer stack. In the developed VELO process, an applied vacuum of ∼ 5000 Pa to the bonded wafer stack removes such detrimental reaction gases, allowing a separation of hard substrate/carrier systems. The VELO process is evaluated with a state-of-the-art thin-film light-emitting diode (TF-LED) phosphide-based epitaxial structure with a buried AlAs sacrificial layer and a simplified LED chip construction at 4-in. wafer level. Characterization of the so-processed LEDs using high-resolution x-ray diffraction, μ -photoluminescence and electrical testing reveal that the VELO TF-LEDs show a comparable performance like to released chips by using conventional grinding/polishing and etching of the GaAs substrate. As our VELO process is non-destructive to the substrate, the GaAs wafers can be reused, enabling lower costs for LED production and reduced toxic waste to establish a green semiconductor production.
- Is Part Of:
- Materials science in semiconductor processing. Volume 71(2017)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 71(2017)
- Issue Display:
- Volume 71, Issue 2017 (2017)
- Year:
- 2017
- Volume:
- 71
- Issue:
- 2017
- Issue Sort Value:
- 2017-0071-2017-0000
- Page Start:
- 389
- Page End:
- 395
- Publication Date:
- 2017-11-15
- Subjects:
- Vacuum epitaxial lift-off (VELO) -- InGaAlP TF-LED -- Reuse GaAs -- AlAs etching -- HRXRD -- μ-PL
Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2017.08.029 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5396.440600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 8110.xml