Cite
HARVARD Citation
Stöhr, F. et al. (n.d.). Optimizing shape uniformity and increasing structure heights of deep reactive ion etched silicon x-ray lenses. Journal of micromechanics and microengineering. p. . [Online].
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Stöhr, F. et al. (n.d.). Optimizing shape uniformity and increasing structure heights of deep reactive ion etched silicon x-ray lenses. Journal of micromechanics and microengineering. p. . [Online].