Optimizing shape uniformity and increasing structure heights of deep reactive ion etched silicon x-ray lenses. (2nd November 2015)
- Record Type:
- Journal Article
- Title:
- Optimizing shape uniformity and increasing structure heights of deep reactive ion etched silicon x-ray lenses. (2nd November 2015)
- Main Title:
- Optimizing shape uniformity and increasing structure heights of deep reactive ion etched silicon x-ray lenses
- Authors:
- Stöhr, Frederik
Wright, Jonathan
Simons, Hugh
Michael-Lindhard, Jonas
Hübner, Jörg
Jensen, Flemming
Hansen, Ole
Poulsen, Henning Friis - Abstract:
- Abstract: Line-focusing compound silicon x-ray lenses with structure heights exceeding 300 μ m were fabricated using deep reactive ion etching. To ensure profile uniformity over the full height, a new strategy was developed in which the perimeter of the structures was defined by trenches of constant width. The remaining sacrificial material inside the lens cavities was removed by etching through the silicon wafer. Since the wafers become fragile after through-etching, they were then adhesively bonded to a carrier wafer. Individual chips were separated using laser micro machining and the 3D shape of fabricated lenses was thoroughly characterized by a variety of means. Optical testing using synchrotron radiation with a photon energy of 56 keV yielded a 300 μ m wide beam with a waist of 980 nm (full width at half maximum) at a focal length of 1.3 m. Optical aberrations are discussed in the context of the shape analysis, where a slight bowing of the lens sidewalls and an insufficiently uniform apex region are identified as resolution-limiting factors. Despite these, the proposed fabrication route proved a viable approach for producing x-ray lenses with large structure heights and provides the means to improve the resolution and capabilities of modern x-ray techniques such as x-ray microscopy and 3D x-ray diffraction.
- Is Part Of:
- Journal of micromechanics and microengineering. Volume 25:Number 12(2015:Dec.)
- Journal:
- Journal of micromechanics and microengineering
- Issue:
- Volume 25:Number 12(2015:Dec.)
- Issue Display:
- Volume 25, Issue 12 (2015)
- Year:
- 2015
- Volume:
- 25
- Issue:
- 12
- Issue Sort Value:
- 2015-0025-0012-0000
- Page Start:
- Page End:
- Publication Date:
- 2015-11-02
- Subjects:
- high-aspect ratio microstructures -- deep reactive ion etching -- x-ray optics -- compound refractive lenses
Microelectromechanical systems -- Periodicals
Micromechanics -- Periodicals
621.38105 - Journal URLs:
- http://iopscience.iop.org/0960-1317 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/0960-1317/25/12/125013 ↗
- Languages:
- English
- ISSNs:
- 0960-1317
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 7846.xml