FFT-impedance spectroscopy analysis of the growth of magnetic metal nanowires in ultra-high aspect ratio InP membranes. (1st October 2015)

• Record Type: Journal Article
• Authors: Gerngross, M-D; Carstensen, J; Föll, H; Adelung, R
• Is Part Of: Semiconductor science and technology. Volume 31:Number 1(2016:Jan.)
• Publication Date: 2015-10-01
• Subjects: FFT impedance spectroscopy -- magnetic nanowires -- porous InP -- electrochemical deposition -- Ni Co FeCo nanowires; Semiconductors -- Periodicals; 621.38152
• DOI: 10.1088/0268-1242/31/1/014005
• Languages: English
• ISSNs: 0268-1242

Abstract

Abstract: This paper reports on the characterization of the electrochemical growth process of magnetic nanowires in ultra-high-aspect ratio InP membranes via in situ fast Fourier transform impedance spectroscopy in a typical frequency range from 75 Hz to 18.5 kHz. The measured impedance data from the Ni, Co, and FeCo can be very well fitted using the same electric equivalent circuit consisting of a series resistance in serial connection to an RC -element and a Maxwell element. The impedance data clearly indicate the similarities in the growth behavior of Ni, Co and FeCo nanowires in ultra-high aspect ratio InP membranes—the beneficial impact of boric acid on the metal deposition in ultra-high aspect ratio membranes and the diffusion limitation of boric acid, as well as differences such as passivation or side reactions.