Corrigendum to Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering [Vacuum 152 (2018) 252–260]. (August 2018)

Record Type:: Journal Article
Title:: Corrigendum to Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering [Vacuum 152 (2018) 252–260]. (August 2018)
Main Title:: Corrigendum to Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering [Vacuum 152 (2018) 252–260]
Authors:: Correia, F.C.
Salvador, P.B.
Ribeiro, J.M.
Mendes, A.
Tavares, C.J.
Abstract:
Is Part Of:: Vacuum. Volume 154(2018)
Journal:: Vacuum
Issue:: Volume 154(2018)
Issue Display:: Volume 154, Issue 2018 (2018)
Year:: 2018
Volume:: 154
Issue:: 2018
Issue Sort Value:: 2018-0154-2018-0000
Page Start:: 340
Page End:
Publication Date:: 2018-08
Subjects:: Vacuum -- Periodicals
621.55
Journal URLs:: http://www.elsevier.com/journals ↗
http://www.sciencedirect.com/science/journal/0042207X ↗
DOI:: 10.1016/j.vacuum.2018.05.037 ↗
Languages:: English
ISSNs:: 0042-207X
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library DSC - 9139.000000
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store
Ingest File:: 7257.xml