Corrigendum to Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering [Vacuum 152 (2018) 252–260]. (August 2018) - Correia, F.C.; Salvador, P.B.; Ribeiro, J.M.; Mendes, A.; Tavares, C.J.