Carbonization in boron-ion-implanted polymethylmethacrylate as revealed from Raman spectroscopy and electrical measurements. Issue 1 (2nd January 2016)

• Record Type: Journal Article
• Authors: Kavetskyy, T.; Nowak, J.; Borc, J.; Rusnák, J.; Šauša, O.; Stepanov, A. L.
• Is Part Of: Spectroscopy letters. Volume 49:Issue 1(2016)
• Page Start: 5
• Page End: 10
• Publication Date: 2016-01-02
• Subjects: Carbon clusters -- conductive layer -- ion implantation -- polymethylmethacrylate -- Raman spectra; Spectrum analysis -- Periodicals; 543.5
• DOI: 10.1080/00387010.2015.1044113
• Languages: English
• ISSNs: 0038-7010

Abstract

ABSTRACT: The results of Raman spectroscopy and electrical measurements of 40 keV boron-ion-implanted polymethylmethacrylate with ion doses from 6.25 × 10 14 to 5.0 × 10 16 ions/cm 2 are reported for the first time. The Raman spectra recorded in the 400–3800 cm −1 range, showing the formation of new carbon–carbon bands for the as-implanted samples at higher ion doses (>10 16 ions/cm 2 ), are found to be an additional support for carbonization processes earlier revealed by slow positrons. The current–voltage dependences at 360 K testify also that the as-implanted samples examined with higher fluences (3.75 × 10 16 and 5.0 × 10 16 ions/cm 2 ) have created a very thin conductive layer or conductive joints due to carbonization.