Influence of growth kinetics on Sn incorporation in direct band gap Ge1−xSnx nanowires. Issue 32 (2nd August 2018)
- Record Type:
- Journal Article
- Title:
- Influence of growth kinetics on Sn incorporation in direct band gap Ge1−xSnx nanowires. Issue 32 (2nd August 2018)
- Main Title:
- Influence of growth kinetics on Sn incorporation in direct band gap Ge1−xSnx nanowires
- Authors:
- Doherty, Jessica
Biswas, Subhajit
Saladukha, Dzianis
Ramasse, Quentin
Bhattacharya, Tara Shankar
Singha, Achintya
Ochalski, Tomasz J.
Holmes, Justin D. - Abstract:
- Abstract : An investigation of the influence of growth kinetics on Sn incorporation in Ge1− x Sn x nanowires. Abstract : Ge1− x Sn x alloys with substantial incorporation of Sn show promise as direct bandgap group IV semiconductors. This article reports the influence of growth kinetics on Sn inclusion in Ge1− x Sn x alloy nanowires through manipulation of the growth constraints, i.e. temperature, precursor type and catalyst. Ge1− x Sn x nanowire growth kinetics were manipulated in a vapour–liquid–solid (VLS) growth process by varying the growth temperature between 425 and 470 °C, using Au and Ag alloys as growth catalysts and different tin precursors such as allyltributytin, tertaethyltin and tetraallyltin. The profound impact of growth kinetics on the incorporation of Sn; from 7 to 9 at%; in Ge1− x Sn x nanowires was clearly apparent, with the fastest growing nanowires (of comparable diameter) containing a higher amount of Sn. A kinetically dependent "solute trapping" process was assigned as the primary inclusion mechanism for Sn incorporation in the Ge1− x Sn x nanowires. The participation of a kinetic dependent, continuous Sn incorporation process in the single-step VLS nanowire growth resulted in improved ordering of the Ge1− x Sn x alloy lattice; as opposed to a randomly ordered alloy. The amount of Sn inclusion and the Sn impurity ordering in Ge1− x Sn x nanowires has a profound effect on the quality of the light emission and on the directness of the band gap asAbstract : An investigation of the influence of growth kinetics on Sn incorporation in Ge1− x Sn x nanowires. Abstract : Ge1− x Sn x alloys with substantial incorporation of Sn show promise as direct bandgap group IV semiconductors. This article reports the influence of growth kinetics on Sn inclusion in Ge1− x Sn x alloy nanowires through manipulation of the growth constraints, i.e. temperature, precursor type and catalyst. Ge1− x Sn x nanowire growth kinetics were manipulated in a vapour–liquid–solid (VLS) growth process by varying the growth temperature between 425 and 470 °C, using Au and Ag alloys as growth catalysts and different tin precursors such as allyltributytin, tertaethyltin and tetraallyltin. The profound impact of growth kinetics on the incorporation of Sn; from 7 to 9 at%; in Ge1− x Sn x nanowires was clearly apparent, with the fastest growing nanowires (of comparable diameter) containing a higher amount of Sn. A kinetically dependent "solute trapping" process was assigned as the primary inclusion mechanism for Sn incorporation in the Ge1− x Sn x nanowires. The participation of a kinetic dependent, continuous Sn incorporation process in the single-step VLS nanowire growth resulted in improved ordering of the Ge1− x Sn x alloy lattice; as opposed to a randomly ordered alloy. The amount of Sn inclusion and the Sn impurity ordering in Ge1− x Sn x nanowires has a profound effect on the quality of the light emission and on the directness of the band gap as confirmed by temperature dependent photoluminescence study and electron energy loss spectroscopy. … (more)
- Is Part Of:
- Journal of materials chemistry. Volume 6:Issue 32(2018)
- Journal:
- Journal of materials chemistry
- Issue:
- Volume 6:Issue 32(2018)
- Issue Display:
- Volume 6, Issue 32 (2018)
- Year:
- 2018
- Volume:
- 6
- Issue:
- 32
- Issue Sort Value:
- 2018-0006-0032-0000
- Page Start:
- 8738
- Page End:
- 8750
- Publication Date:
- 2018-08-02
- Subjects:
- Materials -- Periodicals
Chemistry, Analytic -- Periodicals
Optical materials -- Research -- Periodicals
Electronics -- Materials -- Research -- Periodicals
543.0284 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/tc# ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/c8tc02423e ↗
- Languages:
- English
- ISSNs:
- 2050-7526
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5012.205300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 7114.xml