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APA Citation
Rees, K., Lorusso, E., Cosham, S. D., Kulak, A. N., & Hyett, G. (2018). combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films. Dalton transactions, 47(31), 10536–10543. http://access.bl.uk/ark:/81055/vdc_100066559334.0x000043