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HARVARD Citation
Rees, K. et al. (2018). Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films. Dalton transactions. 47 (31), pp. 10536-10543. [Online].
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Rees, K. et al. (2018). Combining single source chemical vapour deposition precursors to explore the phase space of titanium oxynitride thin films. Dalton transactions. 47 (31), pp. 10536-10543. [Online].