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APA Citation
Pi, T. W., Lin, Y. H., Fanchiang, Y. T., Chiang, T. H., Wei, C. H., Lin, Y. C., Wertheim, G. K., Kwo, J., & Hong, M. (2015). in-situ atomic layer deposition of tri-methylaluminum and water on pristine single-crystal (In)GaAs surfaces: electronic and electric structures. Nanotechnology, 26, . http://access.bl.uk/ark:/81055/vdc_100066493586.0x000017