Cite
MLA Citation
Peter Schnauber et al.. “Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography.” Nanotechnology, vol. 27, 2016, p. . http://access.bl.uk/ark:/81055/vdc_100062159452.0x00001c
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Peter Schnauber et al.. “Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography.” Nanotechnology, vol. 27, 2016, p. . http://access.bl.uk/ark:/81055/vdc_100062159452.0x00001c