Cite
HARVARD Citation
Schnauber, P. et al. (2016). Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography. Nanotechnology. p. . [Online].
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Schnauber, P. et al. (2016). Using low-contrast negative-tone PMMA at cryogenic temperatures for 3D electron beam lithography. Nanotechnology. p. . [Online].