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APA Citation
Huang, C., Mu, W., Zhou, H., Zhu, Y., Xu, X., Jia, Z., Zheng, L., & Tao, X. (2018). effect of OH− on chemical mechanical polishing of β-Ga2O3 (100) substrate using an alkaline slurry. RSC advances, 8(12), 6544–6550. http://access.bl.uk/ark:/81055/vdc_100062167166.0x00003b