Cite
HARVARD Citation
Huang, C. et al. (2018). Effect of OH− on chemical mechanical polishing of β-Ga2O3 (100) substrate using an alkaline slurry. RSC advances. 8 (12), pp. 6544-6550. [Online].
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Huang, C. et al. (2018). Effect of OH− on chemical mechanical polishing of β-Ga2O3 (100) substrate using an alkaline slurry. RSC advances. 8 (12), pp. 6544-6550. [Online].