Epitaxial Stress‐Free Growth of High Crystallinity Ferroelectric PbZr0.52Ti0.48O3 on GaN/AlGaN/Si(111) Substrate. Issue 2 (27th November 2017)
- Record Type:
- Journal Article
- Title:
- Epitaxial Stress‐Free Growth of High Crystallinity Ferroelectric PbZr0.52Ti0.48O3 on GaN/AlGaN/Si(111) Substrate. Issue 2 (27th November 2017)
- Main Title:
- Epitaxial Stress‐Free Growth of High Crystallinity Ferroelectric PbZr0.52Ti0.48O3 on GaN/AlGaN/Si(111) Substrate
- Authors:
- Li, Lin
Liao, Zhaoliang
Gauquelin, Nicolas
Nguyen, Minh Duc
Hueting, Raymond J. E.
Gravesteijn, Dirk J.
Lobato, Ivan
Houwman, Evert P.
Lazar, Sorin
Verbeeck, Johan
Koster, Gertjan
Rijnders, Guus - Abstract:
- Abstract: Due to its physical properties gallium‐nitride (GaN) is gaining a lot of attention as an emerging semiconductor material in the field of high‐power and high‐frequency electronics applications. Therefore, the improvement in the performance and/or perhaps even extension in functionality of GaN based devices would be highly desirable. The integration of ferroelectric materials such as lead–zirconate–titanate (PbZr x Ti1‐ x O3 ) with GaN has a strong potential to offer such an improvement. However, the large lattice mismatch between PZT and GaN makes the epitaxial growth of Pb(Zr1‐ x Ti x )O3 on GaN a formidable challenge. This work discusses a novel strain relaxation mechanism observed when MgO is used as a buffer layer, with thicknesses down to a single unit cell, inducing epitaxial growth of high crystallinity Pb(Zr0.52 Ti0.48 )O3 (PZT) thin films. The epitaxial PZT films exhibit good ferroelectric properties, showing great promise for future GaN device applications. Abstract : A one‐monolayer MgO buffer layer enables epitaxial growth of highly crystalline, ferroelectric PbZr0.52 Zr0.48 O3 (PZT) on GaN/AlGaN/Si. This layer can completely overcome the lattice mismatch and is found to be not strained to the GaN allowing for the growth of epitaxial, functional PZT, paving a bright path toward oxide‐GaN electronics.
- Is Part Of:
- Advanced materials interfaces. Volume 5:Issue 2(2018)
- Journal:
- Advanced materials interfaces
- Issue:
- Volume 5:Issue 2(2018)
- Issue Display:
- Volume 5, Issue 2 (2018)
- Year:
- 2018
- Volume:
- 5
- Issue:
- 2
- Issue Sort Value:
- 2018-0005-0002-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2017-11-27
- Subjects:
- epitaxial growth -- ferroelectric -- gallium nitride -- lead‐zirconate‐titanate (PZT) -- semiconductor
Materials science -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)2196-7350 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/admi.201700921 ↗
- Languages:
- English
- ISSNs:
- 2196-7350
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.898450
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 5745.xml