Simulation study of GaN-based HFETs with graded AlGaN barrier. (July 2015)
- Record Type:
- Journal Article
- Title:
- Simulation study of GaN-based HFETs with graded AlGaN barrier. (July 2015)
- Main Title:
- Simulation study of GaN-based HFETs with graded AlGaN barrier
- Authors:
- Zhou, Xingye
Feng, Zhihong
Fang, Yulong
Wang, Yuangang
Lv, Yuanjie
Dun, Shaobo
Gu, Guodong
Tan, Xin
Song, Xubo
Yin, Jiayun
Cai, Shujun - Abstract:
- Highlights: The trapping behaviors in GaN HFETs with graded AlGaN barrier are investigated. Both the DC characteristics and transient responses of the device are simulated. Two rising trends caused by the bulk and surface traps are observed for the transient current. HFET with graded AlGaN barrier has better immunity to the surface traps. Abstract: GaN-based heterostructure field-effect-transistors (HFETs) with graded AlGaN barrier, in which the Al mole fraction of Al x Ga1− x N ranges from 0 to a certain value (e.g. 35%), demonstrated the potential for high-linearity applications. Based on the two-dimensional (2-D) device simulations, in this paper the trapping effects and current collapse in GaN-based HFETs with graded AlGaN barrier are investigated and analyzed. First, both the carrier profile and direct current (DC) characteristics of the device are obtained for calibration of the simulation model, and the simulation results matched the experimental measurement data very well. In addition, the transient responses of GaN-based HFETs with graded AlGaN barrier are simulated to study the trapping behaviors. As the time increases, two rising trends are observed for the transient current, which are caused by the bulk acceptor traps and surface donor traps, respectively. By comparing with the conventional GaN-based HEMT, the results show that the HFET with graded AlGaN barrier has better immunity to the surface traps, leading to smaller current collapse.
- Is Part Of:
- Solid-state electronics. Volume 109(2015)
- Journal:
- Solid-state electronics
- Issue:
- Volume 109(2015)
- Issue Display:
- Volume 109, Issue 2015 (2015)
- Year:
- 2015
- Volume:
- 109
- Issue:
- 2015
- Issue Sort Value:
- 2015-0109-2015-0000
- Page Start:
- 90
- Page End:
- 94
- Publication Date:
- 2015-07
- Subjects:
- Simulation -- GaN-based HFET -- Graded AlGaN -- Trapping effect
Semiconductors -- Periodicals
Semiconducteurs -- Périodiques
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00381101 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.sse.2015.04.003 ↗
- Languages:
- English
- ISSNs:
- 0038-1101
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8327.385000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 5721.xml