Advantages of InGaN/GaN multiple quantum wells with two-step grown low temperature GaN cap layers. (November 2017)
- Record Type:
- Journal Article
- Title:
- Advantages of InGaN/GaN multiple quantum wells with two-step grown low temperature GaN cap layers. (November 2017)
- Main Title:
- Advantages of InGaN/GaN multiple quantum wells with two-step grown low temperature GaN cap layers
- Authors:
- Zhu, Yadan
Lu, Taiping
Zhou, Xiaorun
Zhao, Guangzhou
Dong, Hailiang
Jia, Zhigang
Liu, Xuguang
Xu, Bingshe - Abstract:
- Abstract: Two-step grown low temperature GaN cap layers (LT-cap) are employed to improve the optical and structural properties of InGaN/GaN multiple quantum wells (MQWs). The first LT-cap layer is grown in nitrogen atmosphere, while a small hydrogen flow is added to the carrier gas during the growth of the second LT-cap layer. High-resolution X-ray diffraction results indicate that the two-step growth method can improve the interface quality of MQWs. Room temperature photoluminescence (PL) tests show about two-fold enhancement in integrated PL intensity, only 25 meV blue-shift in peak energy and almost unchanged line width. On the basis of temperature-dependent PL characteristics analysis, it is concluded that the first and the second LT-cap layer play a different role during the growth of MQWs. The first LT-cap layer acts as a protective layer, which protects quantum well from serious indium loss and interface roughening resulting from the hydrogen over-etching. The hydrogen gas employed in the second LT-cap layer is in favor of reducing defect density and indium segregation. Consequently, interface/surface and optical properties are improved by adopting the two-step growth method. Highlights: Two-step grown low temperature cap layers are employed to improve the quality of active region. Surface and interface properties are improved when the two-step growth method is adopted. Room temperature photoluminescence intensity enhances by about 2-times, while peak energy and lineAbstract: Two-step grown low temperature GaN cap layers (LT-cap) are employed to improve the optical and structural properties of InGaN/GaN multiple quantum wells (MQWs). The first LT-cap layer is grown in nitrogen atmosphere, while a small hydrogen flow is added to the carrier gas during the growth of the second LT-cap layer. High-resolution X-ray diffraction results indicate that the two-step growth method can improve the interface quality of MQWs. Room temperature photoluminescence (PL) tests show about two-fold enhancement in integrated PL intensity, only 25 meV blue-shift in peak energy and almost unchanged line width. On the basis of temperature-dependent PL characteristics analysis, it is concluded that the first and the second LT-cap layer play a different role during the growth of MQWs. The first LT-cap layer acts as a protective layer, which protects quantum well from serious indium loss and interface roughening resulting from the hydrogen over-etching. The hydrogen gas employed in the second LT-cap layer is in favor of reducing defect density and indium segregation. Consequently, interface/surface and optical properties are improved by adopting the two-step growth method. Highlights: Two-step grown low temperature cap layers are employed to improve the quality of active region. Surface and interface properties are improved when the two-step growth method is adopted. Room temperature photoluminescence intensity enhances by about 2-times, while peak energy and line width are almost unchanged by using the two-step growth method. … (more)
- Is Part Of:
- Superlattices and microstructures. Volume 111(2017)
- Journal:
- Superlattices and microstructures
- Issue:
- Volume 111(2017)
- Issue Display:
- Volume 111, Issue 2017 (2017)
- Year:
- 2017
- Volume:
- 111
- Issue:
- 2017
- Issue Sort Value:
- 2017-0111-2017-0000
- Page Start:
- 960
- Page End:
- 965
- Publication Date:
- 2017-11
- Subjects:
- GaN cap layer -- Quantum wells -- Hydrogen -- InGaN
Superlattices as materials -- Periodicals
Microstructure -- Periodicals
Semiconductors -- Periodicals
Superréseaux -- Périodiques
Microstructure (Physique) -- Périodiques
Semiconducteurs -- Périodiques
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/07496036 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.spmi.2017.07.054 ↗
- Languages:
- English
- ISSNs:
- 0749-6036
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8547.076700
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 4843.xml