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APA Citation
Lammatao, J., Chan, L., Owens, T., De Graef, M., & Picard, Y. N. (n.d.). measuring the Strain Sensitivity in Si (001) Electron Channeling Patterns Using Higher-order Laue Zone Line Shifts. Microscopy and microanalysis, 20, 42–43. http://access.bl.uk/ark:/81055/vdc_100050735995.0x000024