Cite
HARVARD Citation
Lammatao, J. et al. (n.d.). Measuring the Strain Sensitivity in Si (001) Electron Channeling Patterns Using Higher-order Laue Zone Line Shifts. Microscopy and microanalysis. pp. 42-43. [Online].
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Lammatao, J. et al. (n.d.). Measuring the Strain Sensitivity in Si (001) Electron Channeling Patterns Using Higher-order Laue Zone Line Shifts. Microscopy and microanalysis. pp. 42-43. [Online].