Formation and evolution of E3 centers in hydrothermally grown zinc oxide. (October 2017)
- Record Type:
- Journal Article
- Title:
- Formation and evolution of E3 centers in hydrothermally grown zinc oxide. (October 2017)
- Main Title:
- Formation and evolution of E3 centers in hydrothermally grown zinc oxide
- Authors:
- Hupfer, A.
Bhoodoo, C.
Vines, L.
Svensson, B.G. - Abstract:
- Abstract: The formation and evolution of the prominent and so-called E3 center in ZnO has been studied by in-situ deep level transient spectroscopy measurements after on-line implantation of hydrogen (H) and deuterium (D) ions at sample temperatures of ∼ 158 K and ∼ 285 K . The formation of E3 is shown to involve migration and subsequent trapping of interstitial hydrogen (H i ), or deuterium, and starts to occur already below 200 K. The concentration of implantation-induced E3 centers is rather unstable and decreases gradually at temperatures around 300 K by an annealing process obeying first-order kinetics. The process exhibits an activation energy of ∼ 0.85 eV and involves presumably trapping of migrating H i 's leading to passivation of the E3 centers. A kinetics model is presented showing good agreement with the experimental data and where the E3 center is assumed to be a complex between a Zn vacancy and three hydrogen atoms ( H 3 V Zn ) . Further, the concentration of E3 centers is found to decrease rapidly during annealing in forming gas ambient at room temperature and then to recover gradually during subsequent annealing in vacuum, indicating a defect 'core' of the E3 center able to accommodate more than one H atom.
- Is Part Of:
- Materials science in semiconductor processing. Volume 69(2017)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 69(2017)
- Issue Display:
- Volume 69, Issue 2017 (2017)
- Year:
- 2017
- Volume:
- 69
- Issue:
- 2017
- Issue Sort Value:
- 2017-0069-2017-0000
- Page Start:
- 13
- Page End:
- 18
- Publication Date:
- 2017-10
- Subjects:
- Defects -- ZnO -- DLTS -- Implantation
Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2017.02.022 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5396.440600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 4643.xml