Cite

MLA Citation

    Neha Chauhan et al.. “N2‐Plasma‐Assisted One‐Step Alignment and Patterning of Graphene Oxide on a SiO2/Si Substrate Via the Langmuir–Blodgett Technique.” Advanced materials interfaces, vol. 2, no. 5, 2015, p. n/a. http://access.bl.uk/ark:/81055/vdc_100042691266.0x000007
  
Back to record