Cite
MLA Citation
Xin-Hong Lu et al.. “21‐2: Highly Reliable Amorphous Indium‐Gallium‐Zinc‐Tin‐Oxide TFTs with Back‐Channel‐Etch Structure.” Digest of technical papers, vol. 48, no. 1, 2017, pp. 291–293. http://access.bl.uk/ark:/81055/vdc_100046624832.0x00004c