Cite
APA Citation
Nag, M., Steudel, S., Chasin, A., Myny, K., Rockele, M., Bhoolokam, A., Willegems, M., Smout, S., Vicca, P., Ameys, M., Schols, S., Cheyns, D., Genoe, J., van der Steen, J., Tempelaars, K., Groeseneken, G., & Heremans, P. (n.d.). paper No 19.3: Back‐Channel‐Etch Process Flow for a‐IGZO TFTs. Digest of technical papers, 44, 285–288. http://access.bl.uk/ark:/81055/vdc_100046580254.0x000001