Formation kinetics and mechanism of metastable vacancy-dioxygen complex in neutron irradiated Czochralski silicon. (July 2017)
- Record Type:
- Journal Article
- Title:
- Formation kinetics and mechanism of metastable vacancy-dioxygen complex in neutron irradiated Czochralski silicon. (July 2017)
- Main Title:
- Formation kinetics and mechanism of metastable vacancy-dioxygen complex in neutron irradiated Czochralski silicon
- Authors:
- Dong, Peng
Wang, Rong
Yu, Xuegong
Chen, Lin
Ma, Xiangyang
Yang, Deren - Abstract:
- Abstract: We have quantitatively investigated the formation kinetics of metastable vacancy-dioxygen (VO2 ) complex in a structure of [VO + O i ], where a VO complex is trapped in a next-neighbor position to an interstitial oxygen atom (O i ). It is found that the VO annihilation is accompanied by the generation of metastable [VO + O i ] complex during annealing in the temperature range of 220–250 °C. The activation energy for [VO + O i ] generation appears at around 0.48 eV, which is much lower than the counterpart of stable VO2 complex. This indicates that the formation of [VO + O i ] complex originates from the reaction between VO and O i . The ab initio calculations show that the formation energy of [VO + O i ] complex is larger than that of VO2 complex, which means that [VO + O i ] complex is thermodynamically unfavorable as compared to VO2 complex. However, the binding energy of [VO + O i ] complex is positive, indicating that [VO + O i ] complex is stable against decomposition of VO and O i in silicon. It is believed that [VO + O i ] complex serves as the intermediate for VO to VO2 conversion. Graphical abstract: Highlights: The formation of metastable vacancy-dioxygen (VO2 ) complex in silicon, with a structure of [VO + Oi ] is quantitatively investigated, which has little been experimentally reported. Combined with the evolution of interstitial oxygen and VO complex during annealing, the mechanisms for [VO + Oi ] formation and VO annihilation have been discussed.
- Is Part Of:
- Superlattices and microstructures. Volume 107(2017)
- Journal:
- Superlattices and microstructures
- Issue:
- Volume 107(2017)
- Issue Display:
- Volume 107, Issue 2017 (2017)
- Year:
- 2017
- Volume:
- 107
- Issue:
- 2017
- Issue Sort Value:
- 2017-0107-2017-0000
- Page Start:
- 91
- Page End:
- 96
- Publication Date:
- 2017-07
- Subjects:
- Czochralski silicon -- Neutron irradiation -- Metastable -- Vacancy-dioxygen complex
Superlattices as materials -- Periodicals
Microstructure -- Periodicals
Semiconductors -- Periodicals
Superréseaux -- Périodiques
Microstructure (Physique) -- Périodiques
Semiconducteurs -- Périodiques
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/07496036 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.spmi.2017.04.005 ↗
- Languages:
- English
- ISSNs:
- 0749-6036
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8547.076700
British Library DSC - BLDSS-3PM
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