Cite
HARVARD Citation
Chu, L. et al. (2017). Mimicking an Atomically Thin "Vacuum Spacer" to Measure the Hamaker Constant between Graphene Oxide and Silica. Advanced materials interfaces. 4 (5), p. n/a. [Online].
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Chu, L. et al. (2017). Mimicking an Atomically Thin "Vacuum Spacer" to Measure the Hamaker Constant between Graphene Oxide and Silica. Advanced materials interfaces. 4 (5), p. n/a. [Online].