Single lithography-step self-aligned fabrication process for Vertical-Cavity Surface-Emitting Lasers. (April 2017)

• Record Type: Journal Article
• Authors: Marigo-Lombart, Ludovic; Arnoult, Alexandre; Mazenq, Laurent; Dubreuil, Pascal; Reig, Benjamin; Mauran, Nicolas; Thienpont, Hugo; Panajotov, Krassimir; Almuneau, Guilhem
• Is Part Of: Materials science in semiconductor processing. Volume 61(2017)
• Page Start: 35
• Page End: 38
• Publication Date: 2017-04
• Subjects: Vertical cavity surface emitting lasers -- Self-aligned processing flow -- Low temperature PECVD -- Lift-off process -- Photonic devices fabrication; Semiconductors -- Periodicals; Integrated circuits -- Materials -- Periodicals; Semiconducteurs -- Périodiques; Circuits intégrés -- Matériaux -- Périodiques; Electronic journals; 621.38152
• DOI: 10.1016/j.mssp.2016.12.026
• Languages: English
• ISSNs: 1369-8001

Abstract

Abstract: We demonstrate a self-aligned process to fabricate Vertical-Cavity Surface-Emitting Lasers (VCSEL) which combines, within a single lithographic step the mesa etch, the surface passivation, the opening of the emission window and the top annular metallization. This process flow, based on a double photoresist layer enabling two lift-off steps, offers great advantages such as easy and fast implementation while insuring a perfect alignment between the emitting window, the passivation layer aperture and the metal-ring contact. VCSEL fabrication is drastically simplified and its repeatability improved. Finally, this process can be advantageously applied to other photonic devices such waveguide-ridge lasers, modulators, LED, etc.